Highly conductive SnO2 thin films for flat-panel displays

Journal of the Society for Information Display

Volumn 15, Issue 2, 2007, Pages 161-166

  Isono, Takamitsu ^a   Fukuda, Takeshi ^b   Nakagawa, Kouji ^c   Usui, Reo ^b   Satoh, Ryohei ^b   Morinaga, Eiji ^b   Mihara, Yu ^b  

^a PANASONIC CORPORATION   (Japan)

^b OSAKA UNIVERSITY   (Japan)

^c ASAHI GLASS CO LTD   (Japan)

Author keywords

Annealing; Flat panel displays; Resistivity; SnO2; Transparent electrode

Indexed keywords

FLAT PANEL DISPLAYS; INDIUM; SILICON COMPOUNDS; THICK FILMS; TIN; TITANIUM COMPOUNDS;

ALTERNATIVE MATERIALS; ANNEALING PROCESSES; CONDUCTIVE; DEPOSITION CONDITIONS; DISPLAY PANELS; HIGH RESISTIVITIES; INDIUM-TIN-OXIDE; RESISTIVITY; SNO2; THIN-FILMS; TRANSPARENT ELECTRODE; TRANSPARENT ELECTRODES;

ANNEALING;

EID: 34547900505     PISSN: 10710922     EISSN: None     Source Type: Journal    
DOI: 10.1889/1.2709738     Document Type: Conference Paper

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