Simply controlled growth condition of thin films of InTaO4(111) on MgO(001) substrates by Ar ion beam sputtering

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 46, Issue 2, 2007, Pages 774-776

  Maruta, Kazuhiko ^a,b   Kawakami, Hajime ^a   Maki, Kunisuke ^a  

^a YOKOHAMA CITY UNIVERSITY   (Japan)

^b Shincron Co Ltd   (Japan)

Author keywords

Ar ion beam sputtering; InTaO4; O2 ion assisted deposition; Ta2O5; Thin film growth

Indexed keywords

CRYSTALLIZATION; ION BEAM ASSISTED DEPOSITION; MAGNETRON SPUTTERING; SEMICONDUCTING INDIUM COMPOUNDS;

AR ION BEAM SPUTTERING; THIN FILM GROWTH;

FILM GROWTH;

EID: 34547866170     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.46.774     Document Type: Article

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