Effect of oxygen annealing on ferroelectricity of BiFeO3 thin films formed by pulsed laser deposition

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 46, Issue 6 A, 2007, Pages 3491-3494

  Go, Hyun Young ^a   Wakiya, Naoki ^b   Funakubo, Hiroshi ^a   Satoh, Keisuke ^c   Kondo, Masao ^c   Cross, Jeffrey S ^c   Maruyama, Kenji ^c   Mizutani, Nobuyasu ^d   Shinozaki, Kazuo ^a  

^a TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

^b SHIZUOKA UNIVERSITY   (Japan)

^c FUJITSU LABORATORIES LTD   (Japan)

^d TOKYO NATIONAL COLLEGE OF TECHNOLOGY   (Japan)

Author keywords

Annealing atmosphere; BiFeO3; Epitaxial film; Pulsed laser deposition; Thin film

Indexed keywords

ANNEALING; MORPHOLOGY; PULSED LASER DEPOSITION; SUBSTRATES;

ANNEALING ATMOSPHERE; EPITAXIAL FILM;

THIN FILMS;

EID: 34547842127     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.46.3491     Document Type: Article

References (14)

1. J. T. Teague, R. Geson, and W. J. James: Solid State Commun. 8 (1970) 1073.
2. S. Shimizu, S. Jinzenji, A. Kajima, and T. Fuji: IEEE Trans. J. Magn. Jpn. 2 (1985) 428.
3. S. Shimizu, S. Jinzenji, A. Kajima, T. Miyama, and T. Fuji: IEEE Trans. J. Magn. Jpn. 2 (1985) 912.
4. A. Kajima, T. Kaneda, G. Ito, and T. Fuji: J. Appl. Phys. 69 (1991) 3663.
5. A. Kajima, T. Kaneda, G. Ito, and T. Fuji: J. Appl. Phys. 70 (1991) 3760.
6. B. U. M. Rao, G. Srinivasan, V. S. Babu, and M. S. Seehara: J. Appl. Phys. 69 (1991) 5463.
7. B. U. M. Rao and G. Srinivasan: Appl. Phys. Lett. 58 (1991) 2441.
8. G. Srinivasan, B. U. M. Rao, and J. Chen: IEEE Trans. Magn. 29 (1993) 3078.
9. A. Kajima, T. Kaneda, G. Ito, and T. Fuji: J. Appl. Phys. 70 (1991) 3760.
10. K. Y. Yun, D. Ricinschi, T. Kanashima, M. Noda, and M. Okuyama: Jpn. J. Appl. Phys. 43 (2004) L647.
11. K. Y. Yun, M. Noda, and M. Okuyama: J. Appl. Phys. 96 (2004) 3399.
12. J. Wang, J. B. Neaton, H. Zheng, V. Nagarajan, S. B. Ogale, B. Liu, D. Viehland, V. Vaithyanathan, D. G. Schlom, U. V. Waghmare, N. A. Spaldin, K. M. Rabe, M. Wuttig, and R. Ramesh: Science 299 (2003) 1719.
13. K. Y. Yun, M. Noda, and M. Okuyama: J. Korean Phys. Soc. 42 (2003) S1153.
14. S. K. Singh and H. Ishiwara: Jpn. J. Appl. Phys. 44 (2005) L734.