Novel planar electrode structure for high-speed (>40GHz) electroabsorption modulators

Japanese Journal of Applied Physics, Part 2: Letters

Volumn 45, Issue 42-45, 2006, Pages

  Wang, Jian ^a   Xiong, Bing ^a   Cai, Peng Fei ^a   Tian, Jian Bo ^a   Sun, Chang Zheng ^a   Luo, Yi ^a  

^a TSINGHUA UNIVERSITY   (China)

Author keywords

Dry etching; Electroabsorption modulators; Inductively coupled plasma

Indexed keywords

CAPACITANCE; DRY ETCHING; ELECTRODES; ELECTRONIC STRUCTURE; PHOTOSENSITIVITY; WAVEGUIDES;

MODULATION BANDWIDTH; NARROW HIGH-MESA WAVEGUIDES; NOVEL PLANAR ELECTRODES; PHOTO-SENSITIVE POLYMERS;

ELECTROABSORPTION MODULATORS;

EID: 34547841931     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.45.L1209     Document Type: Article

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