The effect of oxygen-containing reagents on the crystal morphology and orientation in tungsten oxide thin films deposited via atmospheric pressure chemical vapour deposition (APCVD) on glass substrates

Faraday Discussions

Volumn 136, Issue , 2007, Pages 329-343

  Hyett, Geoffrey ^a   Blackman, Christopher S ^a   Parkin, Ivan P ^a  

^a UNIVERSITY COLLEGE LONDON   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 34547782711     PISSN: 13596640     EISSN: 13645498     Source Type: Journal    
DOI: 10.1039/b615877c     Document Type: Article

References (21)

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