Log data extraction and correlation miner for lithography management system: LMS-LEC

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5755, Issue , 2005, Pages 231-235

  Kawamura, Eichi ^a   Tsuda, Hidetaka ^a   Shirai, Hidehiro ^a   Oishi, Satoru ^b   Ina, Hideki ^b  

^a FUJITSU LABORATORIES LTD   (Japan)

^b CANON INC   (Japan)

Author keywords

Advanced process control; Data mining; Lithography; Log data; Semiconductor

Indexed keywords

COMPUTER SOFTWARE; DATABASE SYSTEMS; ERROR ANALYSIS; LITHOGRAPHY; PROCESS CONTROL; PRODUCTIVITY; SEMICONDUCTOR DEVICE MANUFACTURE; TURNAROUND TIME;

ADVANCED PROCESS CONTROL; EXPOSURE TOOLS; LOG DATA; SEMICONDUCTOR;

DATA MINING;

EID: 25144511398     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.594994     Document Type: Conference Paper

References (5)

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3. U.M. Fayyad, G. Piatetsky-Shapiro, P. Smyth and R. Uthurusamy: Advances in Knowledge Discovery and Data Mining, AAAI/MIT Press, 1996
4. http://www.flt.fujitsu.com/products/analysisforce/dm_1.html
5. http://tw.fujitsu.com/services/manufacturing/DM/dm_1.html