Structural and surface analysis of Mo-W oxide films prepared by atmospheric pressure chemical vapor deposition

Surface and Coatings Technology

Volumn 201, Issue 22-23 SPEC. ISS., 2007, Pages 9378-9384

  Gesheva, K A ^a   Ivanova, T ^a   Marsen, B ^b   Cole, B ^b   Miller, E L ^b   Hamelmann, F ^c  

^a BULGARIAN ACADEMY OF SCIENCES   (Bulgaria)

^b UNIVERSITY OF HAWAII   (United States)

^c BIELEFELD UNIVERSITY   (Germany)

Author keywords

APCVD; Cyclic voltammetry; Electrochromic; Mixed oxide films; XPS

Indexed keywords

CYCLIC VOLTAMMETRY; ELECTROCHROMISM; ELECTRONIC STRUCTURE; KINETIC PARAMETERS; LIGHT ABSORPTION; LIGHT MODULATION; MOLYBDENUM; MORPHOLOGY; OXIDE FILMS; TUNGSTEN;

ATMOSPHERIC PRESSURE CHEMICAL VAPOR DEPOSITION; COLOR EFFICIENCY; SCAN RATE;

CHEMICAL VAPOR DEPOSITION;

CHEMICAL VAPOR DEPOSITION; CYCLIC VOLTAMMETRY; ELECTROCHROMISM; ELECTRONIC STRUCTURE; KINETIC PARAMETERS; LIGHT ABSORPTION; LIGHT MODULATION; MOLYBDENUM; MORPHOLOGY; OXIDE FILMS; TUNGSTEN;

EID: 34547684037     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2007.04.088     Document Type: Article

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