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Volumn 201, Issue 22-23 SPEC. ISS., 2007, Pages 9325-9329

Silicon CVD deposition for low cost applications in photovoltaics

Author keywords

Atmospheric pressure CVD; Emitter; High temperature CVD; Low cost CVD; Silicon thin film; Solar cells

Indexed keywords

ATMOSPHERIC PRESSURE; CHEMICAL VAPOR DEPOSITION; CRYSTALLINE MATERIALS; PHOTOVOLTAIC CELLS; SOLAR CELLS; THIN FILMS;

EID: 34547680448     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2007.04.089     Document Type: Article
Times cited : (24)

References (12)
  • 3
    • 34547716702 scopus 로고    scopus 로고
    • D. Biro, PhD Thesis, Durchlaufdiffusion für die Photovoltaik, Freiburg, 2003.
  • 4
    • 34547724611 scopus 로고    scopus 로고
    • E. Schmich, H. Lautenschlager, J. Hees, F. Trenkle, T. Frieβ, N. Schillinger, S. Reber, n-type emitter epitaxy for crystalline silicon thin-film solar cells, Progress in Photovoltaics 2007; to be published.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.