Phosphane copper(I) complexes as CVD precursors

Surface and Coatings Technology

Volumn 201, Issue 22-23 SPEC. ISS., 2007, Pages 9089-9094

  Roth, Nina ^a   Jakob, Alexander ^a   Waechtler, Thomas ^a   Schulz, Stefan E ^a   Gessner, Thomas ^a   Lang, Heinrich ^a  

^a CHEMNITZ UNIVERSITY OF TECHNOLOGY   (Germany)

Author keywords

Copper(I); CVD; Phosphane; Phosphite

Indexed keywords

CHEMICAL VAPOR DEPOSITION; COPPER; DECOMPOSITION; PARTICLE SIZE; SUBSTRATES; SYNTHESIS (CHEMICAL); TEMPERATURE DISTRIBUTION;

CHEMICAL VAPOR DEPOSITION REACTOR; PHOSPHANE COPPER;

ORGANOMETALLICS;

CHEMICAL VAPOR DEPOSITION; COPPER; DECOMPOSITION; ORGANOMETALLICS; PARTICLE SIZE; SUBSTRATES; SYNTHESIS (CHEMICAL); TEMPERATURE DISTRIBUTION;

EID: 34547654431     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2007.05.004     Document Type: Article

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