An oxygen-compatible radiant substrate heater for thin film growth at substrate temperatures up to 1050 °C

Review of Scientific Instruments

Volumn 68, Issue 6, 1997, Pages 2538-2541

  Clark, J C ^a   Maria, J P ^a   Hubbard, K J ^a,b   Schlom, D G ^a  

^a PENNSYLVANIA STATE UNIVERSITY   (United States)

^b Chorus Corporation   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0009254780     PISSN: 00346748     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1148156     Document Type: Article

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