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Volumn 54, Issue 7, 2007, Pages 1454-1462

Polishing of quartz by rapid etching in ammonium bifluoride

Author keywords

[No Author keywords available]

Indexed keywords

AMMONIUM COMPOUNDS; DATA REDUCTION; POLISHING; QUARTZ; SURFACE ROUGHNESS;

EID: 34547452072     PISSN: 08853010     EISSN: None     Source Type: Journal    
DOI: 10.1109/TUFFC.2007.406     Document Type: Article
Times cited : (7)

References (19)
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    • Finch, G.I.1    Quarrell, A.G.2
  • 3
    • 0026385794 scopus 로고
    • Quartz: A material for microdevices
    • J. S. Danel and G. Delapierre, "Quartz: A material for microdevices," J. Micromech. Microeng., vol. 1, pp. 187-198, 1991.
    • (1991) J. Micromech. Microeng , vol.1 , pp. 187-198
    • Danel, J.S.1    Delapierre, G.2
  • 5
    • 0035161342 scopus 로고    scopus 로고
    • Mass production of quartz high-speed chemical etching applied to AT-cut wafers
    • presented at, Piscataway, NJ
    • T. Watanabe, "Mass production of quartz high-speed chemical etching applied to AT-cut wafers," presented at Proc. IEEE Int. Freq. Contr. Symp. and PDA Exhibit., Piscataway, NJ, 2001.
    • (2001) Proc. IEEE Int. Freq. Contr. Symp. and PDA Exhibit
    • Watanabe, T.1
  • 6
    • 34547408590 scopus 로고    scopus 로고
    • Etching method and article processed by the method,
    • European patent application EP 1 127 965 A1, 2001
    • T. Watanabe, "Etching method and article processed by the method," European patent application EP 1 127 965 A1, 2001.
    • Watanabe, T.1
  • 7
    • 0020542127 scopus 로고
    • Fluoride-based etchants for quartz
    • J. K. Vondeling, "Fluoride-based etchants for quartz," J. Mat. Sci., vol. 18, pp. 304-314, 1983.
    • (1983) J. Mat. Sci , vol.18 , pp. 304-314
    • Vondeling, J.K.1
  • 9
    • 5244227055 scopus 로고
    • Some results on chemical etching of AT-cut quartz wafers in ammonium bifluoride solutions
    • C. R. Tellier, "Some results on chemical etching of AT-cut quartz wafers in ammonium bifluoride solutions," J. Mat. Sci., vol. 17, pp. 1348-1354, 1982.
    • (1982) J. Mat. Sci , vol.17 , pp. 1348-1354
    • Tellier, C.R.1
  • 11
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    • 0023534922 scopus 로고
    • Effects of initial quartz surface finish and etch removal on etch figures and quartz crystal Q
    • K. H. Jones, "Effects of initial quartz surface finish and etch removal on etch figures and quartz crystal Q," in Proc. 41st Annu. Freq. Contr. Symp., 1987, pp. 199-212.
    • (1987) Proc. 41st Annu. Freq. Contr. Symp , pp. 199-212
    • Jones, K.H.1
  • 17
    • 0014800514 scopus 로고
    • Cleaning solutions based on hydrogen peroxide for use in silicon semiconductor technology
    • W. Kern and D. A. Puotinen, "Cleaning solutions based on hydrogen peroxide for use in silicon semiconductor technology," RCA Review, vol. 31, pp. 187-206, 1970.
    • (1970) RCA Review , vol.31 , pp. 187-206
    • Kern, W.1    Puotinen, D.A.2
  • 18
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    • The evolution of silicon wafer cleaning technology
    • W. Kern, "The evolution of silicon wafer cleaning technology," J. Electrochem. Soc., vol. 137, pp. 1887-1892, 1990.
    • (1990) J. Electrochem. Soc , vol.137 , pp. 1887-1892
    • Kern, W.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.