MOCVD of CoAl2O4 thin films from {CO[AI(O iC3HT)4]2} as precursor

Chemistry of Materials

Volumn 19, Issue 14, 2007, Pages 3381-3386

  El Habra, N ^a   Crociani, L ^a   Sada, C ^b   Zanella, P ^a   Casarin, M ^b   Rossetto, G ^a   Carta, G ^a   Paolucci, G ^c  

^a CNR   (Italy)

^b UNIVERSITY OF PADOVA   (Italy)

^c CA' FOSCARI UNIVERSITY OF VENICE   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; METALLORGANIC CHEMICAL VAPOR DEPOSITION; NUCLEAR MAGNETIC RESONANCE SPECTROSCOPY; SECONDARY ION MASS SPECTROMETRY; SYNTHESIS (CHEMICAL); THERMAL EFFECTS; THERMOANALYSIS; THIN FILMS;

MOLECULAR PROPERTIES; SINGLE-SOURCE PRECURSOR; SYNTHETIC ROUTE;

COBALT COMPOUNDS;

EID: 34547349827     PISSN: 08974756     EISSN: None     Source Type: Journal    
DOI: 10.1021/cm0615931     Document Type: Article

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