Glass nanoimprint using amorphous Ni-P mold etched by focused-ion beam

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 25, Issue 4, 2007, Pages 1025-1028

  Mekaru, Harutaka ^a   Kitadani, Takeshi ^b   Yamashita, Michiru ^c   Takahashi, Masaharu ^a  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

^b Sawa Plating Co Ltd   (Japan)

^c HYOGO PREFECTURAL INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS MATERIALS; ETCHING; FOCUSED ION BEAMS; NICKEL ALLOYS;

ELECTROLESS PLATED; GLASS NANOIMPRINT; GLASSLIKE CARBON SUBSTRATES; INDUSTRIAL GLASS;

NANOIMPRINT LITHOGRAPHY;

AMORPHOUS MATERIALS; ETCHING; NICKEL; PRINTING;

EID: 34547243040     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2734155     Document Type: Article

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