Effects of isomeric transformation on characteristics of Alq3 amorphous layers prepared by vacuum deposition at various substrate temperatures

Journal of Applied Physics

Volumn 101, Issue 12, 2007, Pages

  Jian, Zhi An ^a   Luo, Ying Zi ^a   Chung, Jia Ming ^a   Tang, Shiow Jing ^a   Kuo, Ming Chin ^a   Shen, Ji Lin ^a   Chiu, Kuan Cheng ^a   Yang, Chu Shou ^b   Chou, Wu Ching ^b   Dai, Chung Feng ^a   Yeh, Jui Ming ^a  

^a CHUNG YUAN CHRISTIAN UNIVERSITY   (Taiwan)

^b NATIONAL CHIAO TUNG UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS ALLOYS; ATOMIC FORCE MICROSCOPY; CURRENT DENSITY; DEGRADATION; ELECTRIC CONDUCTIVITY; ELECTRIC FIELDS; INFRARED ABSORPTION; ISOMERS; SUBSTRATES; SURFACE MORPHOLOGY; THERMAL EFFECTS; VACUUM DEPOSITION;

AMORPHOUS LAYERS; ANOMALOUS TSUB; ELECTRICAL CHARACTERISTICS; ELECTRICAL PROPERTIES;

ALUMINUM ALLOYS;

EID: 34547238756     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2749209     Document Type: Article

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