Electrochemical behavior of magnetron-sputtered Al-Cu alloy films in sulfate solutions

Journal of the Electrochemical Society

Volumn 154, Issue 6, 2007, Pages

  Idrac, J ^a   Blanc, Ch ^a,d   Kihn, Y ^b   Lafont, M C ^a   Mankowski, G ^a   Skeldon, P ^a,d   Thompson, G E ^c,d  

^a INSTITUT CARNOT CIRIMAT   (France)

^b CEMES CNRS   (France)

^c UNIVERSITY OF MANCHESTER   (United Kingdom)

^d ELECTROCHEMICAL SOCIETY   (France)

Author keywords

[No Author keywords available]

Indexed keywords

CATHODIC REGION; COPPER CONTENTS; SULFATE SOLUTIONS;

ALUMINUM ALLOYS; BINARY ALLOYS; CATHODES; MAGNETRON SPUTTERING; SULFUR COMPOUNDS; SYNTHESIS (CHEMICAL);

METALLIC FILMS;

EID: 34547191812     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.2719623     Document Type: Article

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