Porous anodic film formation on an Al-3.5 wt% Cu alloy

Journal of the Electrochemical Society

Volumn 147, Issue 3, 2000, Pages 1015-1020

  Paez, M A ^a   Bustos, O ^a   Thompson, G E ^b   Skeldon, P ^b   Shimizu, K ^c   Wood, G C ^b  

^a UNIVERSIDAD DE SANTIAGO DE CHILE   (Chile)

^b UNIVERSITY OF MANCHESTER   (United Kingdom)

^c KEIO UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM; ANODIC OXIDATION; COPPER; DISSOLUTION; ELECTROLYTES; ELECTROLYTIC POLISHING; FILM GROWTH; OXYGEN; PHASE INTERFACES; POROSITY; SOLID SOLUTIONS;

ANODIC FILM GROWTH; FIELD ASSISTED DISSOLUTION; SUPERPURE ALUMINUM;

ALUMINUM ALLOYS;

EID: 0033907734     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1393306     Document Type: Article

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