Thermal change of Alq3, tris(8-hydroxyquinolinato) aluminum(III) studied by TG and XRD-DSC

Journal of Thermal Analysis and Calorimetry

Volumn 89, Issue 2, 2007, Pages 363-366

  Wang, M H ^a   Sawada, Y ^a   Saito, K ^a   Horie, S ^a   Uchida, T ^a   Ohtsuka, M ^a   Seki, S ^a   Kobayashi, S ^a   Arii, T ^b   Kishi, A ^b   Takahashi, T ^b   Nishimoto, Y ^c   Wakimoto, T ^d   Monzen, K ^d   Kashima, I ^d   Nishikiori, T ^d   Sun, L X ^e   Ozao, R ^f  

^a TOKYO POLYTECHNIC UNIVERSITY   (Japan)

^b RIGAKU CORPORATION   (Japan)

^c KANAGAWA UNIVERSITY   (Japan)

^d Optrex Co   (Japan)

^e DALIAN INSTITUTE OF CHEMICAL PHYSICS   (China)

^f SONY CORPORATION   (Japan)

Author keywords

Alq3; Mass loss; Phase change; TG; XRD DSC

Indexed keywords

DIFFERENTIAL SCANNING CALORIMETRY; EVAPORATION; MELTING; PARTIAL PRESSURE; WATER VAPOR; X RAY DIFFRACTION;

MASS LOSS; PEAK TEMPERATURE; PHASE CHANGE; THERMAL CHANGE;

ALUMINUM COMPOUNDS;

EID: 34547161969     PISSN: 13886150     EISSN: None     Source Type: Journal    
DOI: 10.1007/s10973-006-8216-8     Document Type: Conference Paper

References (17)

1. C. W. Tang and S. A. VanSlyke, Appl. Phys. Lett., 51 (1987) 913.
2. R. F. Service, Science, 267 (1995) 1262.
3. T. Uchida, S. Kaneta, M. Ichihara, M. Ohtsuka, T. Otomo and D. R. Marx, Jpn. J. Appl. Phys., 44 (2005) L282.
4. T. Uchida, T. Mimura, M. Ohtsuka, T. Otomo, M. Ide, A. Shida and Y. Sawada, Thin Solid Films, 496 (2006) 75.
5. C. W. Tang, S. A. VanSlyke and C. H. Chen, J. Appl. Phys., 65 (1989) 3610.
6. J. Shi, Appl. Phys. Lett, 70 (1997) 1665.
7. L. Hung, C. W. Tang and M. Mason, Appl. Phys. Lett., 70 (1997) 152.
8. H. Aziz, Z. Popovic, N. X. Hu, A. Hor and G. Xu, Science, 283 (1999) 1900.
9. P. Burrows, Z. Shen, V. Bulovic, D. McCarty, S. Forrest, J. Cronin and M. Thompson, J. Appl. Phys., 79 (1996) 7991.
10. S. Berleb and W. Brütting, Phys. Rev. Lett., 89 (2002) 286601.
11. M. Cölle and W. Brütting, Phys. Stat. Sol., 201 (2004) 1095.
12. M. Colle and W. Brutting, Adv. Funct. Maters, 13 (2003) 108.
13. M. W. Shin, H. C. Lee, K. S. Kim, S. H. Lee and J. C. Kim, Thin Solid Films, 363 (2000) 244.
14. F. Papadimitrakopoulos, X. M. Zhang, D. L. Thomsen and K. A. Higginson, Chem. Mater., 8 (1996) 1363.
15. F. Papadimitrakopoulos and X. M. Zhang, Synth. Met., 85 (1997) 1221.
16. M. Brinkmann, G. Gadret, M. Muccini, C Taliani, N. Masciocchi and A. Sironi, J. Am. Chem. Soc., 122 (2000) 5147.
17. Sawada, Rigaku J. (in Japanese), 37 (2006) 20.