Fast and slow charge trapping/detrapping processes in high-k nMOSFETs

IEEE International Integrated Reliability Workshop Final Report

Volumn , Issue , 2006, Pages 120-124

  Heh, Dawei ^a   Choi, Rino ^a   Young, Chadwin D ^a   Bersuker, Gennadi ^a  

^a SEMATECH   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC DISCHARGES; MOSFET DEVICES; RELAXATION PROCESSES; STRESS ANALYSIS; THRESHOLD VOLTAGE;

DETRAPPING PROCESSES; RELAXATION EFFECTS;

CHARGE TRAPPING;

EID: 34547153357     PISSN: 19308841     EISSN: 23748036     Source Type: Conference Proceeding    
DOI: 10.1109/IRWS.2006.305224     Document Type: Conference Paper

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