Reactive pulsed laser deposition of gold nitride thin films

Applied Surface Science

Volumn 253, Issue 19, 2007, Pages 8037-8040

  Caricato, A P ^a   Fernandez M ^a   Leggieri, G ^a   Luches, A ^a   Martino, M ^a   Romano, F ^a   Tunno, T ^a   Valerini, D ^a   Verdyan, A ^b   Soifer, Y M ^b   Azoulay, J ^b   Meda, L ^c  

^a UNIVERSITY OF SALENTO   (Italy)

^b HOLON INSTITUTE OF TECHNOLOGY   (Israel)

^c Polimeri Europa SpA   (Italy)

Author keywords

Gold nitride thin films; Reactive laser ablation; X ray photoemission spectroscopy; Young's modulus

Indexed keywords

ATOMIC FORCE MICROSCOPY; ELASTIC MODULI; FILM GROWTH; GOLD COMPOUNDS; MICROHARDNESS; PULSED LASER DEPOSITION; SCANNING ELECTRON MICROSCOPY;

DEPOSITION PRESSURE; GOLD NITRIDE THIN FILMS; REACTIVE LASER ABLATION;

THIN FILMS;

EID: 34447338033     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2007.02.081     Document Type: Article

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