Microstructural characterization of electron beam-physical vapor deposition thermal barrier coatings through high-resolution computed microtomography

Metallurgical and Materials Transactions A: Physical Metallurgy and Materials Science

Volumn 35 A, Issue 7, 2004, Pages 1945-1952

  Kulkarni, Anand ^a   Herman, Herbert ^a   DeCarlo, Francesco ^b   Subramanian, Ramesh ^c  

^a Stony Brook University   (United States)

^b ARGONNE NATIONAL LABORATORY   (United States)

^c SIEMENS POWER GENERATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; COMPUTERIZED TOMOGRAPHY; CONDENSATION; ELASTIC MODULI; ELECTRON BEAMS; MICROSTRUCTURE; NUCLEATION; PHYSICAL VAPOR DEPOSITION; POROSITY; STRESS RELIEF; THERMAL EFFECTS;

ELECTRON BEAM VAPOR DEPOSITION; HIGH RESOLUTION COMPUTED MICROTOMOGRAPHY; INTERCOLUMNAR POROSITY; ISOTHERMAL ANNEALING; THERMOMECHANICAL LOADING; VAPOR CONDENSATION; X RAY COMPUTED MICROTOMOGRAPHY;

THERMAL BARRIER COATINGS;

EID: 3442881368     PISSN: 10735623     EISSN: None     Source Type: Journal    
DOI: 10.1007/s11661-004-0143-3     Document Type: Article

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