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Volumn 46, Issue 4, 2007, Pages

Fabrication of Yb3+:Er3+ co-doped Al2O3 ridge waveguides by the dry etching

Author keywords

Dry etching; Erbium; Optical amplifiers; Optical gain

Indexed keywords

DRY ETCHING; ERBIUM; FABRICATION; OPTICAL GAIN; PHOTOLUMINESCENCE; PLASMA ETCHING; YTTERBIUM;

EID: 34250778405     PISSN: 00913286     EISSN: 15602303     Source Type: Journal    
DOI: 10.1117/1.2721529     Document Type: Article
Times cited : (2)

References (8)
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    • Characterization of CN films prepared by ECR plasma source enhanced DC magnetron sputtering
    • J. Xu, X. L. Deng, J. L. Zhang, W. Q. Lu, and T. C. Ma, "Characterization of CN films prepared by ECR plasma source enhanced DC magnetron sputtering," Thin Solid Films 390, 107-112 (2001).
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.