Testing the viscoelastic properties of SU8 photo resist thin films at different stages of processing by nanoindentation creep and stress relaxation

International Journal of Materials Research

Volumn 98, Issue 5, 2007, Pages 397-403

  Schiffmann, Kirsten Ingolf ^a   Brill, Carsten ^a  

^a FRAUNHOFER INSTITUTE FOR SURFACE ENGINEERING AND THIN FILMS IST   (Germany)

Author keywords

Creep; Nanoindentation; Relaxation; SU8; Viscoelastic properties

Indexed keywords

CROSSLINKING; NANOINDENTATION; PHOTORESISTS; STRESS RELAXATION; VISCOELASTICITY;

ELASTIC RECOVERY; RELAXATION MODULUS; RETARDATION TIME SPECTRA;

THIN FILMS;

EID: 34250220701     PISSN: 18625282     EISSN: None     Source Type: Journal    
DOI: 10.3139/146.101485     Document Type: Article

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