The junction challenges in the FinFETs device

Extended Abstracts of the Sixth International Workshop on Junction Technology, IWJT '06

Volumn , Issue , 2006, Pages 78-83

  Lenoble, Damien ^a   Doornbos, Gerben ^b   De Keersgieter, An ^c   Pawlak, Bartek ^b   Vandervorst, Wilfried ^c   Jurczak, Malgorzata ^c   Skotnicki, Thomas ^a  

^a STMICROELECTRONICS   (France)

^b PHILIPS RESEARCH LABORATORIES   (Netherlands)

^c IMEC   (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

CMOS INTEGRATED CIRCUITS; CONTACT RESISTANCE; DOPING (ADDITIVES); ION BEAMS; ION IMPLANTATION; SEMICONDUCTOR JUNCTIONS;

DOUBLE GATE TRANSISTORS; ION BEAM IMPLANTATION; PARASITIC RESISTANCE; SOURCE/DRAIN EXTENSION (SDE);

FIELD EFFECT TRANSISTORS;

EID: 34250208441     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/iwjt.2006.220865     Document Type: Conference Paper

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