Methacrylate homo- and copolymers containing photosensitive abietate group: Their high thermal stability, unique photocrosslinking behavior, transparency, and photolithographic application

Chemistry of Materials

Volumn 19, Issue 11, 2007, Pages 2898-2902

  Kwak, Giseop ^a   Choi, Jae Ung ^a   Seo, Kwan Ho ^a   Park, Lee Soon ^a   Hyun, Seok Hee ^a   Kim, Woo Sik ^a  

^a Kyungpook National University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

MOLECULAR WEIGHT; MONOMERS; ORGANIC SOLVENTS; PHOTOLITHOGRAPHY; SOLVENT EXTRACTION; SYNTHESIS (CHEMICAL); THERMODYNAMIC STABILITY;

ABIETIC ACIDS; PHOTOCROSSLINKING BEHAVIOR; PHOTOSENSITIVE ABIETATE GROUPS;

COPOLYMERS;

EID: 34250207738     PISSN: 08974756     EISSN: None     Source Type: Journal    
DOI: 10.1021/cm062861y     Document Type: Article

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