Rewritable microrelief formation on photoresponsive hydrogel layers

Chemistry of Materials

Volumn 19, Issue 11, 2007, Pages 2730-2732

  Szilágyi, András ^a,b   Sumaru, Kimio ^a   Sugiura, Shinji ^a   Takagi, Toshiyuki ^a   Shinbo, Toshio ^a   Zrínyi, Miklós ^b   Kanamori, Toshiyuki ^a  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

^b INSTITUTE OF EXPERIMENTAL MEDICINE   (Hungary)

Author keywords

[No Author keywords available]

Indexed keywords

ASPECT RATIO; CHARGE DENSITY; CHROMOPHORES; LIGHT EMISSION; ORGANIC POLYMERS; SURFACE CHEMISTRY;

BLUE LIGHT; LIGHT IRRADIATION; PHOTORESPONSIVE HYDROGEL LAYERS; SPIROBENZOPYRAN;

HYDROGELS;

EID: 34250205643     PISSN: 08974756     EISSN: None     Source Type: Journal    
DOI: 10.1021/cm070444v     Document Type: Article

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