Design of bossed silicon membranes for high sensitivity microphone applications

Microsystem Technologies

Volumn 13, Issue 11-12, 2007, Pages 1495-1500

  Martins, P ^a   Beclin, S ^b   Brida, S ^b   Metivet, S ^b   Stojanovic, O ^b   Malhaire, C ^a  

^a INSTITUT DES NANOTECHNOLOGIES DE LYON   (France)

^b Esterline Sensors Group   (France)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL SENSORS; FINITE ELEMENT METHOD; POLYSILICON; REACTIVE ION ETCHING; SILICON ON INSULATOR TECHNOLOGY; THIN FILMS; TRANSDUCERS;

DEVICE FABRICATION; DEVICE PERFORMANCE; SILICON MEMBRANES; THIN FILM STRESSES;

MICROPHONES;

EID: 34249799635     PISSN: 09467076     EISSN: None     Source Type: Journal    
DOI: 10.1007/s00542-006-0347-0     Document Type: Conference Paper

References (4)

1. Sze SM (ed) (1994) Semiconductor sensor. Wiley, New York. Chap. 4
2. Tachung C. Yih, T Chiming Wei, MD, Bashar Hammad (2005) Modeling and characterization of a nanoliter drug-delivery MEMS. In: Nanomedicine: nanotechnology, biology, and medicine, vol. 1. Elsevier, Amsterdam, pp 164-175
3. Tajima T, Nishiguchi T, Chiba S, Morita A, Abe M, Tanioka K, Saito N, Esashi M (2003) High-performance ultra-small single crystalline silicon microphone of an integrated structure. Microelectron Eng 67-68:508-519
4. Timoshenko SP, Woinowski-Krieger S (1959) Theory of plates and shells. McGraw-Hill International Edition, New York