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Journal of Analytical Atomic Spectrometry

Volumn 22, Issue 6, 2007, Pages 623-629

Analysis of Si wafer coated by spin-on-glass for laser ablation ICP-MS

(5) Ryu, W K a Kim, J S a Lee, J S b Lim, H B a Jun, P K b

a Dankook University (South Korea)

b SAMSUNG Electronics (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

CONTAMINATION; GLYCOLS; INDUCTIVELY COUPLED PLASMA; LASER ABLATION; MASS SPECTROMETRY; OPTIMIZATION; SCANNING ELECTRON MICROSCOPY; SILICA; SILICON WAFERS;

FOCUSED BEAM DIAMETER; POLYPYLENES; SPIKING; SPIN-ON-GLASS (SOG);

GLASS;

EID: 34249691984 PISSN: 02679477 EISSN: 13645544 Source Type: Journal
DOI: 10.1039/b618184h Document Type: Article

Times cited : (9)

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