Finite element analysis of the effect of electrode resistivity on resistivity measurement in a diamond anvil cell

Applied Physics Letters

Volumn 90, Issue 20, 2007, Pages

  Huang, Xiaowei ^a   Gao, Chunxiao ^a   Zhang, Dongmei ^a   Li, Ming ^a   He, Chunyuan ^a   Hao, Aimin ^a   Yu, Cuiling ^a   Sang, Chong ^a   Liu, Cailong ^a   Wang, Yue ^a   Guan, Rui ^a   Li, Dongmei ^a   Zou, Guangtian ^a   Ma, Yanzhang ^b  

^a JILIN UNIVERSITY   (China)

^b Texas Tech University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DIAMOND ANVIL CELL; FOUR POINT PROBE METHOD; RESISTIVITY DIFFERENCES;

ELECTRIC CONDUCTIVITY; ELECTRODES; ERROR ANALYSIS; FINITE ELEMENT METHOD; MEASUREMENT ERRORS; PROBES;

DIAMONDS;

EID: 34249111190     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2739086     Document Type: Article

References (18)

1. H. K. Mao and P. M. Bell, Year Book - Carnegie Inst. Washington 75, 824 (1976).
2. S. Block, R. A. Forman, and G. J. Piermarini, in High Pressure Research: Applications in Geophysics, edited by, M. H. Manghnani, and, S. Akimoto, (Academic, New York, 1997), p. 503.
3. H. K. Mao and P. M. Bell, Rev. Sci. Instrum. 52, 615 (1981).
4. N. Sakai, T. Kajiwara, K. Tsuji, and S. Minomura, Rev. Sci. Instrum. 53, 499 (1982).
5. Y. S. Xu, C. McCammon, and B. T. Poe, Science 282, 922 (1998).
6. N. W. Ashcroft, Nature (London) 419, 569 (2002).
7. Katsuya Shimizu, Hiroto Ishikawa, Daigoroh Takao, Takehiko Yagi, and Kiichi Amaya, Nature (London) 419, 597 (2002).
8. S. T. Weir, J. Akella, C. Aracne-Ruddle, Y. K. Vohra, and S. A. Catledge, Appl. Phys. Lett. 77, 3400 (2000).
9. Yonghao Han and Chunxiao Gao, Appl. Phys. Lett. 86, 064104 (2005).
10. Robin L. Reichlin, Rev. Sci. Instrum. 54, 12 (1983).
11. Fengnian Pu, Sci. China, Ser. A: Math., Phys., Astron. Technol. Sci. 7, 736 (1991).
12. M. S. Bruno and K. J. Dunn, Rev. Sci. Instrum. 55, 940 (1984).
13. W. C. Moss, J. O. Hallquist, R. Reichlin, K. A. Goettel, and S. Martin, Appl. Phys. Lett. 48, 1258 (1986).
14. W. C. Moss and K. A. Goettel, Appl. Phys. Lett. 50, 25 (1987).
15. Śbastien Merkel, Russell J. Hemley, and Ho-kwang Mao, Appl. Phys. Lett. 74, 656 (1999).
16. Boris Kiefer and Thomas S. Duffy, J. Appl. Phys. 97, 114902 (2005).
17. L. B. Valdes, Proc. IRE 42, 420 (1954).
18. L. J. van der Pauw, Philips Tech. Rev. 20, 220 (1958).