The molecular orientation of DNA bases on H-passivated Si(1 1 1) surfaces investigated by means of near edge X-ray absorption fine structure spectroscopy

Surface Science

Volumn 601, Issue 11, 2007, Pages 2291-2296

  Seifert, Stefan ^a   Gavrila, Gianina N ^a   Zahn, Dietrich R T ^a   Braun, Walter ^b  

^a CHEMNITZ UNIVERSITY OF TECHNOLOGY   (Germany)

^b HAHN MEITNER INSTITUT   (Germany)

Author keywords

Adenine; Core level; Cytosine; DNA base; Guanine; Molecular orientation; Near edge X ray absorption fine structure spectroscopy; NEXAFS; Photoemission spectroscopy

Indexed keywords

MOLECULAR ORIENTATION; PHOTOELECTRON SPECTROSCOPY; SILICON; SUBSTRATES; SURFACE CHEMISTRY; X RAY ABSORPTION NEAR EDGE STRUCTURE SPECTROSCOPY;

ADENINE; CORE LEVEL; CYTOSINE; GUANINE;

DNA;

EID: 34249082415     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.susc.2007.01.022     Document Type: Article

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