Crystallization and electrical properties of V 2 O 5 thin films prepared by RF sputtering

Applied Surface Science

Volumn 253, Issue 17, 2007, Pages 7094-7099

  Akl, Alaa A ^a  

^a MINIA UNIVERSITY   (Egypt)

Author keywords

Electrical properties; RF sputtering; Thin films; Vanadium pentoxide

Indexed keywords

ACTIVATION ENERGY; CRYSTALLIZATION; ELECTRIC CONDUCTIVITY; FILM THICKNESS; GRAIN BOUNDARIES; MICROSTRUCTURE; REACTIVE SPUTTERING; VANADIUM COMPOUNDS; X RAY DIFFRACTION;

DARK CONDUCTIVITY; FUCHS-SONDHEIMER RELATION; POTENTIAL BARRIER HEIGHT; RF SPUTTERING; VANADIUM PENTOXIDE;

THIN FILMS;

EID: 34249036835     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2007.02.054     Document Type: Article

References (20)

1. Ramana C.V., Hussain O.M., Srinivasalu N.B., Julien C., and Balkanski M. Mater. Sci. Eng. B 52 (1998) 32
2. Fujita Y., Miyazaki K., and Tatsuyama C. Jpn J. Appl. Phys. 24 8 (1985) 1082
3. Moshfegh A.Z., and Ignatiev A. Thin Solid Films 198 (1991) 251
4. Ottaviano L., Pennisi A., Simone F., and Salvi A.M. Opt. Mater. 27 (2004) 307
5. Rajendra Kumar R.T., Karunugaran B., Senthil Kumar V., Jeyachandran Y.L., Mangalaraj D., and Narayandass Sa.K. Mat. Sci. Semi. Pro. 6 (2003) 543
6. Ramana C.V., Naidu B.S., Hussain O.M., and Pinto R. J. Phys. D: Appl. Phys. 34 (2001) L35
7. Thi B.N.B., Minh T.P., and Simona B. J. Appl. Phys. 80 (1996) 7041
8. Madhuri K.V., Srinivasa R.K., Uthanna S., Naidu B.S., and Hussan O.M. J. Indian Inst. Sci. 81 (2001) 653
9. Akl A.A. Appl. Surf. Sci. 252 (2006) 8745
10. Berg S., and Nyberg T. Thin Solid Film 476 (2005) 215
11. Klug H.P., and Alexander L.E. X-ray Diffraction Procedures for Polycrystaaline and Amorphous Materials. second ed. (1974), Wiley, New York
12. Navone C., Pereira-Ramose J.P., Baddour-Hadjean R., and Salot R. J. of Power Sources 146 (2005) 327
13. Seto J.Y.W. J. Appl. Phys. 46 (1975) 5247
14. Lingm C.H., Fisher J.H., and Anderson J.C. Thin Solid Films 14 (1972) 267
15. Gould G.N., and Moraga L.A. Thin Solid Films. 10 (1972) 327
16. Baccarini G., Ricco B., and Spadini B. J. Appl. Phys. 49 (1978) 5565
17. Julien C., Eddrief M., Kambas F., and Balkanski M. Thin Solid Films 137 (1986) 27
18. Qi-Hui W., Thissen A., Jaegermann W., and Meilin L. Appl. Surf. Sci. 236 (2004) 473
19. Masetti E., Varsano F., Decker F., and Krasilnikova A. Electrochimica. Acta 46 (2001) 2085
20. Ashour A., El-Kadry N., Ebid M.R., Farghal M., and Ramadan A.A. Thin Solid Films 279 (1996) 242