Time dependence of internal stress and optical characteristics of SiO 2 optical thin film

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6469, Issue , 2007, Pages

  Murotani, Hiroshi ^a   Arai, Kentaro ^a   Wakaki, Moriaki ^a  

^a TOKAI UNIVERSITY   (Japan)

Author keywords

Internal stress; Ion assisted depositiona; Optical thin film; SiO2

Indexed keywords

DEPOSITION; OPTICAL FILMS; REFRACTIVE INDEX; RESIDUAL STRESSES; SILICA; VACUUM DEPOSITION;

ION-ASSISTED DEPOSITION; OPTICAL THIN FILMS; TIME DEPENDENCE;

THIN FILMS;

EID: 34248677089     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.699462     Document Type: Conference Paper

References (4)

1. S. Mohan and G. M. Krishna, "A review of ion beam assisted deposition of optical thin films," Vacuum, 46(7), 645-659 (1995).
2. T. Aoki, "Optical Coatings and Their Starting Materials," The Review of Laser Engineering, 24(1), 61-73 (1996).
3. Y. J. Robic, and B. Rafin, "Residual stress in silicon dioxide thin films produced by ion-assisted deposition," Thin Solid Films, 290/291, 34-39 (1996).
4. 2 layers. Long-term evolution," Appl. Opt. 35, 5067-5072 (1996).