Nitridation of silica characterized by high-energy X-ray diffraction technique

Journal of the American Ceramic Society

Volumn 90, Issue 5, 2007, Pages 1562-1565

  Wakihara, Toru ^a   Yamakawa, Tomohiro ^a   Tatami, Junichi ^a   Komeya, Katsutoshi ^a   Meguro, Takeshi ^a   Kohara, Shinji ^b  

^a YOKOHAMA NATIONAL UNIVERSITY   (Japan)

^b JAPAN SYNCHROTRON RADIATION RESEARCH INSTITUTE   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

AMMONIA; AMORPHOUS SILICON; CRYSTALLIZATION; FUNCTION EVALUATION; NITRIDATION; X RAY DIFFRACTION;

AMMONIA GAS; HIGH ENERGY X-RAY DIFFRACTION (HEXRD); OXYNITRIDE;

SILICA;

EID: 34248549934     PISSN: 00027820     EISSN: 15512916     Source Type: Journal    
DOI: 10.1111/j.1551-2916.2007.01577.x     Document Type: Article

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