A study of direct- and pulse-current chromium electroplating on rotating cylinder electrode (RCE)

Applied Surface Science

Volumn 253, Issue 16, 2007, Pages 6829-6834

  Chang, J H ^a   Hsu, F Y ^b   Liao, M J ^a   Huang, C A ^a  

^a CHANG GUNG UNIVERSITY   (Taiwan)

^b MING CHI UNIVERSITY OF TECHNOLOGY   (Taiwan)

Author keywords

Chromium electroplating; RCE; Rotating speed; TEM microstructure

Indexed keywords

CATALYSIS; CHROMIUM; CURRENT DENSITY; ELECTRODES; MICROSTRUCTURE; TRANSMISSION ELECTRON MICROSCOPY;

CHROMIUM ELECTROPLATING; DISLOCATION DENSITY; ROTATING CYLINDER ELECTRODE (RCE); ROTATING SPEED; TEM MICROSTRUCTURE;

ELECTROPLATING;

EID: 34248326934     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2007.01.124     Document Type: Article

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