Nitriles adsorbed on Si(001) at 300 K studied Via synchrotron radiation core-electron spectroscopies

International Journal of Nanoscience

Volumn 6, Issue 2, 2007, Pages 85-94

  Rochist, François ^a   Bournel, Fabrice ^a   Carniato, Stephane ^a   Dufour, Georges ^a   Gallet, Jean Jacques ^a   Ilakovac, Vita ^a   Le Guen, Karine ^a   Rangan, Sylvie ^a,c   Kubsky, Stephan ^b   Sirotti, Fausto ^b  

^a SORBONNE UNIVERSITÉ   (France)

^b SYNCHROTRON SOLEIL   (France)

^c RUTGERS UNIVERSITY   (United States)

Author keywords

Molecule; NEXAFS; Nitrile; Silicon; Synchrotron radiation; XPS

Indexed keywords

ADSORPTION; CHEMICAL BONDS; MOLECULAR DYNAMICS; SYNCHROTRON RADIATION; X RAY ABSORPTION FINE STRUCTURE SPECTROSCOPY; X RAY PHOTOELECTRON SPECTROSCOPY;

ADSORPTION MODES; NITRILE MOLECULES;

NITRILE RESINS;

EID: 34248201643     PISSN: 0219581X     EISSN: None     Source Type: Journal    
DOI: 10.1142/S0219581X07004328     Document Type: Article

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