Second order effects of aspect ratio variations in high sensitivity grating couplers

Microelectronic Engineering

Volumn 84, Issue 5-8, 2007, Pages 1775-1778

  Darwish, N ^a   Dieguez L ^a   Moreno, M ^a   Munoz F ^b   Mas, R ^b   Mas, J ^b   Samitier, J ^a   Nilsson, B ^c   Petersson, G ^c  

^a UNIVERSITY OF BARCELONA   (Spain)

^b INSTITUTO DE MICROELECTRÓNICA DE BARCELONA   (Spain)

^c CHALMERS UNIVERSITY OF TECHNOLOGY   (Sweden)

Author keywords

e Beam lithography; Finite depth grating; Grating coupler; Optical biosensor

Indexed keywords

DIFFRACTION GRATINGS; ELECTROCHEMICAL ETCHING; MATHEMATICAL MODELS; MICROFABRICATION; MICROSENSORS;

E-BEAM LITHOGRAPHY; FINITE DEPTH GRATING; GRATING COUPLERS; OPTICAL BIOSENSORS;

WAVEGUIDE COUPLERS;

EID: 34247642717     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2007.01.179     Document Type: Article

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