The optical properties of monolayer amorphous Al2O3-TiO2 composite films used as HT-APSM blanks for ArF immersion lithography

Microelectronic Engineering

Volumn 84, Issue 5-8, 2007, Pages 716-720

  Lai, Fu Der ^a   Huang, C Y ^b   Ko, Fu Hsiang ^c  

^a NATIONAL KAOHSIUNG UNIVERSITY OF APPLIED SCIENCES   (Taiwan)

^b TATUNG UNIVERSITY   (Taiwan)

^c NATIONAL CHIAO TUNG UNIVERSITY   (Taiwan)

Author keywords

ArF immersion lithography; Composite film; High transmittance attenuated phase shift mask; Optical property

Indexed keywords

ALUMINUM COMPOUNDS; LITHOGRAPHY; MAGNETRON SPUTTERING; MONOLAYERS; OPTICAL PROPERTIES; PHASE SHIFT;

ARF IMMERSION LITHOGRAPHY; HIGH TRANSMITTANCE ATTENUATED PHASE SHIFT MASK; MOLE FRACTION; ROOM TEMPERATURE;

COMPOSITE FILMS;

EID: 34247605040     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2007.01.214     Document Type: Article

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