Fine-tuning of GaAs photonic crystal cavities by digital etching

Microelectronic Engineering

Volumn 84, Issue 5-8, 2007, Pages 1405-1407

  Sunner T ^a   Herrmann, R ^a   Loffler A ^a   Kamp, M ^a   Forchel, A ^a  

^a UNIVERSITY OF WÜRZBURG   (Germany)

Author keywords

Etching; Photonic crystal cavities; Post fabrication technique

Indexed keywords

ETCHING; HETEROJUNCTIONS; OXIDATION; SEMICONDUCTING GALLIUM ARSENIDE; TUNING; WAVELENGTH;

DIGITAL ETCHING; PHOTONIC CRYSTAL CAVITIES; POST FABRICATION TECHNIQUE; RESONANCE WAVELENGTH;

PHOTONIC CRYSTALS;

EID: 34247577588     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2007.01.064     Document Type: Article

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