Characterization of fluorine-doped silicon dioxide films by Raman spectroscopy and Electron-spin resonance

Thin Solid Films

Volumn 515, Issue 17, 2007, Pages 6682-6685

  Matsuda, K ^a   Yamaguchi, Y ^a   Morita, N ^a   Matsunobe, T ^a   Yoshikawa, M ^a  

^a TORAY RESEARCH CENTER INC   (Japan)

Author keywords

ESR; Optical properties; Raman scattering; Silicon oxide

Indexed keywords

ADHESION; DANGLING BONDS; DOPING (ADDITIVES); FLUORINE; PARAMAGNETIC RESONANCE; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; POLARIZATION; RAMAN SPECTROSCOPY;

FILM PROPERTIES; HIGH-DENSITY PLASMA; RING DEFECTS; WATER PERMEATION;

SILICA;

EID: 34247571390     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2007.01.056     Document Type: Article

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