Microstructure and physical properties of nanofaceted antimony doped tin oxide thin films deposited by chemical vapor deposition on different substrates

Thin Solid Films

Volumn 515, Issue 16 SPEC. ISS., 2007, Pages 6518-6520

  Outemzabet, R ^a   Bouras, N ^a   Kesri, N ^a  

^a UNIVERSITY OF SCIENCES AND TECHNOLOGY HOUARI BOUMEDIENE   (Algeria)

Author keywords

CVD; Microstructure; Nanofaceted; Physical properties

Indexed keywords

ANTIMONY; ATMOSPHERIC PRESSURE; CHEMICAL VAPOR DEPOSITION; MICROSTRUCTURE; NANOTECHNOLOGY; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTOR DOPING; TIN OXIDES;

ANTIMONY ATOMS CONCENTRATION; DOPED FILMS; HORIZONTAL REACTORS; OPTICAL PARAMETERS;

THIN FILMS;

EID: 34247539455     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2006.11.069     Document Type: Article

References (4)

1. Chopra K.L., Major S., and Pandya D. Thin Solid Films 102 1 (1983) 1
2. Outemzabet R., and Kesri N. Phys. Chem. News (PCN) 6 1 (2002) 59
3. Outemzabet R., Gabouze N., Kesri N., and Cheraga H. Phys. Status Solidi, C 2 9 (2005) 3394
4. Elangovan E., and Ramamurthi K. Cryst. Res. Technol. 38 9 (2003) 779