Xenon Difluoride dry etching of Si, SiGe alloy and Ge

Third International SiGe Technology and Device Meeting, ISTDM 2006 - Conference Digest

Volumn 2006, Issue , 2006, Pages

  Guangchi, Xuan ^a   Adam, Thomas N ^a,d   Suehle, John ^b   Fitzgerald, Eugene ^c   Lv, Pengcheng ^a   Sustersic, Nathan ^a   Coppinger, Matthew John ^a   Kolodzey, James ^a  

^a University of Delaware   (United States)

^b NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

^c MASSACHUSETTS INSTITUTE OF TECHNOLOGY   (United States)

^d IBM   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 34247500427     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (4)

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2. C. O. Chui, H. Kim, P. C. McIntyre, and K. C. Saraswat, Tech. Dig. - Int. Electron Devices Meet. 2003, 437 (2003)
3. Sherif Sedky, Roger T. Howe, and Tsu-Jae King, J. Microelectromechanical Sys., 13 (4) 669 (2004)
4. J. Sangrador, J. Olivares, E. Iborra, L. Vergara, M. Clement, and A. Sanz-Hervas, Smart Sensors, Actuators, and MEMS II, Carles Cane, Jung-Chih Chiao, Fernando Vidal Verdu, Editors, July 2005, pp. 1-15