Chemical stability of CaCu3Ti4O12 thin films grown by MOCVD on different substrates

Thin Solid Films

Volumn 515, Issue 16 SPEC. ISS., 2007, Pages 6470-6473

  Lo Nigro, Raffaella ^a   Toro, Roberta G ^b   Malandrino, Graziella ^b   Fragalà, Ignazio L ^b   Fiorenza, Patrick ^b   Raineri, Vito ^a  

^a CNR   (Italy)

^b UNIVERSITY OF CATANIA   (Italy)

Author keywords

Calcium copper titanate; Dielectric; MOCVD; Perovskite; Thin films

Indexed keywords

CALCIUM COMPOUNDS; DIELECTRIC PROPERTIES; FILM GROWTH; METALLORGANIC CHEMICAL VAPOR DEPOSITION; MOLTEN MATERIALS; TRANSMISSION ELECTRON MICROSCOPY;

CALCIUM COPPER TITANATE; PEROVSKITES; SILICON SUBSTRATES;

THIN FILMS;

EID: 34247469280     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2006.11.050     Document Type: Article

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