|
Volumn 502, Issue , 2005, Pages 417-422
|
The effects of thickness and underlayer on both grain growth and internal stresses in Cu thin films
a
NONE
(Japan)
|
Author keywords
Cu films; Grain growth; Hardness; Internal stress; Voids
|
Indexed keywords
COPPER;
DEPOSITION;
FILM THICKNESS;
GRAIN GROWTH;
HARDNESS;
RESIDUAL STRESSES;
THERMODYNAMIC STABILITY;
RESIDUAL INTERNAL STRESSES;
THERMAL DEFECTS;
VOIDS;
THIN FILMS;
|
EID: 34247257240
PISSN: 02555476
EISSN: 16629752
Source Type: Book Series
DOI: 10.4028/0-87849-980-6.417 Document Type: Conference Paper |
Times cited : (1)
|
References (14)
|