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Volumn 502, Issue , 2005, Pages 417-422

The effects of thickness and underlayer on both grain growth and internal stresses in Cu thin films

Author keywords

Cu films; Grain growth; Hardness; Internal stress; Voids

Indexed keywords

COPPER; DEPOSITION; FILM THICKNESS; GRAIN GROWTH; HARDNESS; RESIDUAL STRESSES; THERMODYNAMIC STABILITY;

EID: 34247257240     PISSN: 02555476     EISSN: 16629752     Source Type: Book Series    
DOI: 10.4028/0-87849-980-6.417     Document Type: Conference Paper
Times cited : (1)

References (14)
  • 2
    • 35248869451 scopus 로고    scopus 로고
    • K. Hinode, I. Asano, T. Ishida, and Y. Homma, J. Vac. Sci. Technol. B8 (3) (1990) p.495.
    • K. Hinode, I. Asano, T. Ishida, and Y. Homma, J. Vac. Sci. Technol. Vol. B8 (3) (1990) p.495.
  • 5
    • 35248879452 scopus 로고
    • Ph.D. Dissertation, Stanford University
    • P. R. Besser, Ph.D. Dissertation, Stanford University, 1994.
    • (1994)
    • Besser, P.R.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.