High-K dielectrics for inter-poly application in non volatile memories

Microelectronics Reliability

Volumn 47, Issue 4-5 SPEC. ISS., 2007, Pages 598-601

  Sebastiani, A ^a   Piagge, R ^a   Modelli, A ^a   Ghidini, G ^a  

^a STMICROELECTRONICS   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINA; CURRENT VOLTAGE CHARACTERISTICS; DATA STORAGE EQUIPMENT; HEAT TREATMENT; LEAKAGE CURRENTS;

3-MASKS PROCESS FLOW; NON VOLATILE MEMORIES;

DIELECTRIC MATERIALS;

EID: 34247166644     PISSN: 00262714     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.microrel.2007.01.045     Document Type: Article

References (6)

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4. Ludeke R., et al. Appl Phys Lett 76 (2000) 2886-2888
5. Alessandri M et al. Meet. Abstr. ECS 502, 498, 2006.
6. Ghidini G., et al. Proc IRPS (2002) 415-416