Si nanocrystals in SiO2 films analyzed by small angle X-ray scattering

Thin Solid Films

Volumn 515, Issue 14 SPEC. ISS., 2007, Pages 5637-5640

  Bernstorff, S ^a   Dubcek P ^b   Kovacevic I ^b   Radic N ^b   Pivac, B ^b  

^a SINCROTRONE TRIESTE   (Italy)

^b RUDER BO KOVI INSTITUTE   (Croatia)

Author keywords

Si nanostructures; SiO SiO2 amorphous superlattice; Small angle X ray scattering

Indexed keywords

AMORPHOUS SILICON; MAGNETRON SPUTTERING; NANOCRYSTALS; SILICA; SUPERLATTICES; X RAY SCATTERING;

GRAZING-INCIDENCE SMALL-ANGLE X-RAY SCATTERING (GISAXS); SI NANOSTRUCTURES; SIO/SIO2 AMORPHOUS SUPERLATTICE;

THIN FILMS;

EID: 34247100234     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2006.12.015     Document Type: Article

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