Development of embedded capacitor with bismuth-based pyrochlore thin films at low temperatures for printed circuit board applications

Microelectronics Reliability

Volumn 47, Issue 4-5 SPEC. ISS., 2007, Pages 755-758

  Park, Jong Hyun ^a   Xian, Cheng Ji ^a   Seong, Nak Jin ^a   Yoon, Soon Gil ^a   Son, Seung Hyun ^b   Chung, Hyung Mi ^b   Moon, Jin Suck ^b   Jin, Hyun Joo ^b   Lee, Seung Eun ^b   Lee, Jeong Won ^b   Kang, Hyung Dong ^b   Chung, Yeoul Kyo ^b   Oh, Yong Soo ^b  

^a Chungnam National University   (South Korea)

^b Samsung Electro Mechanics   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

BISMUTH COMPOUNDS; CRYSTALLIZATION; CURRENT DENSITY; DIELECTRIC PROPERTIES; LOW TEMPERATURE EFFECTS; PRINTED CIRCUIT BOARDS; THIN FILMS;

CAPACITANCE DENSITY; EMBEDDED CAPACITORS; OXYGEN FLOW RATES;

CAPACITORS;

EID: 34247096052     PISSN: 00262714     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.microrel.2007.01.038     Document Type: Article

References (5)

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3. Cann D.P., Randall C.A., and Shrout T.R. Solid State Commun 100 (1996) 529
4. Cullity B.D., and Stock S.R. Elements of X-ray diffraction (2001), Prentice Hall p. 170
5. Park J.H., Xian C.J., Seong N.J., Yoon S.G., Son S.H., Chung H.M., et al. Appl Phys Lett 89 (2006) 232910