Realization of a high capacitance density in Bi2Mg 2/3Nb4/3O7 pyrochlore thin films deposited directly on polymer substrates for embedded capacitor applications

Applied Physics Letters

Volumn 89, Issue 23, 2006, Pages

  Park, Jong Hyun ^a   Xian, Cheng Ji ^a   Seong, Nak Jin ^a   Yoon, Soon Gil ^a   Son, Seung Hyun ^b   Chung, Hyung Mi ^b   Moon, Jin Suck ^b   Jin, Hyun Joo ^b   Lee, Seung Eun ^b   Lee, Jeong Won ^b   Kang, Hyung Dong ^b   Chung, Yeoul Kyo ^b   Oh, Yong Soo ^b  

^a Chungnam National University   (South Korea)

^b Samsung Electro Mechanics   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

BISMUTH COMPOUNDS; CAPACITANCE; CAPACITORS; PERMITTIVITY; POLYMERS; THICK FILMS;

CAPACITOR APPLICATIONS; NANOCRYSTALLINES; POLYMER SUBSTRATES;

THIN FILMS;

EID: 33845407714     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2402896     Document Type: Article

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