Erratum: Studies of protection of iron corrosion by rosin imidazoline self-assembled monolayers (Surface and Interface Analysis (2007) 39 (317-323) 10.1002/sia.2497);Studies of protection of iron corrosion by rosin imidazoline self-assembled monolayers

Surface and Interface Analysis

Volumn 39, Issue 4, 2007, Pages 317-323

  Liu, Xiuyu ^a   Chen, Shenhao ^a,b   Tian, Fang ^a   Ma, Houyi ^a   Shen, Lixia ^a   Zhai, Hongyan ^a  

^a SHANDONG UNIVERSITY   (China)

^b INSTITUTE OF METAL RESEARCH   (China)

Author keywords

Electrochemical impedance spectroscopy; Imidazoline; Molecular simulation; Scanning electron microscopy; X ray photoelectron spectroscopy

Indexed keywords

CORROSION INHIBITORS; ELECTROCHEMICAL IMPEDANCE SPECTROSCOPY; IRON; SCANNING ELECTRON MICROSCOPY; SELF ASSEMBLED MONOLAYERS; SURFACE ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

DIETHYLENETRIAMINE (DETA); ELECTROCHEMICAL POLARIZATION CURVES; IMIDAZOLINE; MOLECULAR SIMULATION; ROSIN ACID;

CORROSION PROTECTION;

EID: 34147197886     PISSN: 01422421     EISSN: 10969918     Source Type: Journal    
DOI: 10.1002/sia.2532     Document Type: Erratum

References (35)

1. Xia Y, Whitesides GM. Angew. Chem. Int. Ed. Engl. 1998; 37: 550.
2. Felhosi I, Judit T. Electrochim. Acta 2002; 47:2335.
3. Volmer M, Stratmann M. Appl. Surf. Sci. 1992; 55:19.
4. Nozawa K, Aramaki K. Corros. Sci. 1999; 41: 57.
5. Aramaki K. Corros. Sci. 2000; 42: 2023.
6. Grundmeier G, Reinartz C, Rohwerder M. Electrochim. Acta 1998; 43:165.
7. Ramachandran S. Corrosion 1999; 55:259.
8. Lopez DA, Schreiner WH. Appl. Surf. Sci. 2004; 236: 77.
9. Szyprowski AJ. Br. Corros. J. 2002; 37:141.
10. Mcmahon AJ. Colloids Surf. 1991; 59:187.
11. Edmondson JG. Patent No. 4 647 366, United States Patent, Washington, America, 1987.
12. Kubo M, Sotoya K, Okabe K. Patent No. 4 709 045, United States Patent, Washington, America, 1987.
13. Zhao L, Teng HK, Yang YS, Tan X. Mater. Corro. 2004; 55: 684.
14. Wang DX, Li SY, Ying Y, Xiao HM, Chen ZX. Corros. Sci. 1999; 41:1911.
15. Chandross M, Grest GS, Stevens MJ. Langmuir 2002; 18: 8392.
16. Jiang SY. Mol. Phys. 2002; 100:2261.
17. Zheng J. Langmuir 2004; 20: 8931.
18. Ma HY, Chen SH, Li DG, Quan ZL, Niu L. J. Appl. Electrochem. 2002; 32: 65.
19. Khaled KF. Electrochim. Acta 2003; 48: 2493.
20. Lopez DA, Simison SN, Sanchez SR. Corros. Sci. 2005; 47: 735.
21. Wu XJ, Ma HY, Chen SH. J. Electrochem. Soc. 1999; 146:1847.
22. Ma HY, Cheng X, Li GQ, Chen SH. Corros. Sci. 2000; 42:1669.
23. Hsu CH, Mansfeld F. Corrosion 2001; 57: 747.
24. Rengamani S, Venkatakrishna SJ. Appl. Electrochem. 1994; 24:355.
25. Ruediger S, Garsten W, Wolfgang K. J. Electroanal. Chem. 2003; 540: 540 145.
26. Lkadi L, Mernari B, Traisnel M, Bentiss F, Lagrenee M. Corros. Sci. 2000; 42: 703.
27. Yi- XK, Xin XQ, Zhu JJ. Appl. Surf. Sci. 1998; 135: 307.
28. Olivares OX, Likhanova NV, Likhanova MA. Appl. Surf. Sci. 2006; 252: 2139.
29. Ochoa N, Moran F, Pebere N, Tribollet B. Corros. Sci. 2005; 47: 593.
30. Seal S, Sapre K, Kalea A, Desai V, Gopal M, Jepson P. Corros. Sci. 2000:42: 1623.
31. Bentiss F, Traisnel M, Gengembre L, Lagrenee M. Appl. Surf. Sci. 1999; 152: 244.
32. Choi DJ, You SJ, Kim JG. Mater. Sci. Eng. 2002; 335: 228.
33. Cruz J, Martinez R. J. Electroanal. Chem. 2004; 566:111.
34. Khaled KF. Electrochim. Acta 2003; 48: 2493.
35. Olovares OX, Likhanova NV. Appl. Surf. Sci. 2006; 252: 2139.