Growth of silicon nanowires on UV-structurable glass using self-organized nucleation centres

Physica E: Low-Dimensional Systems and Nanostructures

Volumn 38, Issue 1-2, 2007, Pages 40-43

  Tonisch, K ^a   Weise, F ^a   Stubenrauch, M ^a   Cimalla, V ^a   Ecke, G ^a   Will, F ^a   Romanus, H ^a   Mrotzek, S ^a   Hofmeister, H ^b   Hoffmann, M ^a   Hulsenberg D ^a   Ambacher, O ^a  

^a ILMENAU UNIVERSITY OF TECHNOLOGY   (Germany)

^b MAX PLANCK INSTITUTE OF MICROSTRUCTURE PHYSICS   (Germany)

Author keywords

FIB; Nanowires; UV structurable glass

Indexed keywords

CATALYSTS; CRYSTALLIZATION; GLASS; GROWTH (MATERIALS); ION BEAMS; LOW PRESSURE CHEMICAL VAPOR DEPOSITION; NUCLEATION; SILICON;

DIRECT DEPOSITION; METALLIC CLUSTERS; PHOTOSTRUCTURABLE GLASS; SELF-ORGANIZED NUCLEATION CENTRES;

NANOWIRES;

EID: 34147166098     PISSN: 13869477     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.physe.2007.01.001     Document Type: Article

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