The effect of thickness on the properties of titanium films deposited by dc magnetron sputtering

Materials Science and Engineering: A

Volumn 458, Issue 1-2, 2007, Pages 361-365

  Jeyachandran, Y L ^a   Karunagaran, B ^a   Narayandass, Sa K ^a   Mangalaraj, D ^a  

^a BHARATHIAR UNIVERSITY   (India)

Author keywords

Properties; Thickness; Titanium films

Indexed keywords

CRYSTAL MICROSTRUCTURE; CRYSTAL ORIENTATION; FILM THICKNESS; GRAIN SIZE AND SHAPE; MAGNETRON SPUTTERING; OPTICAL PROPERTIES; SUBSTRATES; SURFACE STRUCTURE; TITANIUM;

DIRECT CURRENT MAGNETRON SPUTTERING; TITANIUM FILM;

METALLIC FILMS;

CRYSTAL MICROSTRUCTURE; CRYSTAL ORIENTATION; FILM THICKNESS; GRAIN SIZE AND SHAPE; MAGNETRON SPUTTERING; METALLIC FILMS; OPTICAL PROPERTIES; SUBSTRATES; SURFACE STRUCTURE; TITANIUM;

EID: 34147092567     PISSN: 09215093     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.msea.2006.12.088     Document Type: Article

References (10)

1. Jeyachandran Y.L., Karunagaran B., Narayandass Sa.K., Mangalaraj D., Jenkins T.E., and Martin P.J. Mater. Sci. Eng. A 431 (2006) 277
2. Poppeller M., and Abermann R. Thin Solid Films 295 (1997) 60
3. Cai K., Muller M., Bossert J., Rechtenbach A., and Jandt K.D. Appl. Surf. Sci. 250 (2005) 75
4. Hesse R., Chasse T., Streubel P., and Szargan R. Surf. Interf. Anal. 36 (2004) 1373
5. Forouhi A.R., and Bloomer J. Phys. Rev. B 38 (1989) 1865
6. Tompkins H.G., Gregory R., and Boeck B. Surf. Interf. Anal. 17 (1991) 22
7. Wagner C.D., Riggs W.M., Davis L.E., Moulder J.F., and Mulengreg G.E. Handbook of X-ray Photoelectron Spectroscopy (1979), Physical Electrons Division, Perkin-Elmer Corp., Eden Praire, MN
8. Checcbetto R. Thin Solid Films 302 (1997) 77
9. Suzuki T., Kamimura Y., and Kirchiner K.O.K. Phil. Mag. A 79 (1999) 1629
10. S.R. McCarthy, North Dakota University, US, ICDD Grant-in-Aid, 1993 (JCPDS No. 44-1294).