Chemical characterization of plasma-polymerized films from acetylene and nitrogen-containing mixtures and their ethanol vapor sensitivity

Radiation Physics and Chemistry

Volumn 76, Issue 6, 2007, Pages 941-950

  Chen, Ko Shao ^a   Wei, Ta Chin ^b   Li, Ming Shu ^a   Wu, Hsin Ming ^a   Tang, Tzu Piao ^c   Wang, Chieh Ying ^b   Tu, Yu Chieh ^a  

^a TATUNG UNIVERSITY   (Taiwan)

^b CHUNG YUAN CHRISTIAN UNIVERSITY   (Taiwan)

^c NATIONAL TAIPEI UNIVERSITY OF TECHNOLOGY   (Taiwan)

Author keywords

Acetylene; Alcohol sensitivity; Characterization; Nitrogen containing mixtures; PECVD

Indexed keywords

ACETYLENE; HYDROGEN BONDS; MIXTURES; NITROGEN; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PLASMA POLYMERIZATION;

ALCOHOL SENSITIVITY; ETHANOL VAPOR SENSITIVITY; NITROGEN CONTAINING MIXTURES;

THIN FILMS;

ACETYLENE; ALCOHOL; AMMONIA; CARBON; HYDROGEN; NITROGEN; POLYMER;

ADSORPTION; ARTICLE; CHEMICAL ANALYSIS; CHEMICAL BOND; PLASMA; POLYMERIZATION; VAPOR; X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 34047092464     PISSN: 0969806X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.radphyschem.2006.06.008     Document Type: Article

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